IEEE Electron Device Letters · 1992 · 38 citations · 6 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesDevice CharacterizationHigh-frequency Semiconductor DevicesIntegrated Circuit DesignWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsCurrent GainCutoff FrequencyEtch MechanismsEtch RateThreshold VoltageTransconductance
Excellent uniformity in the threshold voltage, transconductance, and current-gain cutoff frequency of InAlAs/InGaAs/InP MODFETs has been achieved using a selective wet gate recess process. An etch rate ratio of 25 was achieved for InGaAs over InAlAs using a 1:1 citric acid:H/sub 2/O/sub 2/ solution. By using this solution for gate recessing, the authors have achieved a threshold voltage standard deviation of 15 mV and a transconductance standard deviation of 15 mS/mm for devices across a quarter of a 2-in-diameter wafer. The average threshold voltage, transconductance, and current-gain cutoff frequency of 1.0- mu m gate-length devices were -234 mV, 355 mS/mm, and 32 GHz, respectively.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
6
High-performance submicrometer AlInAs-GaInAs HEMT's
Umesh K. Mishra, April S. Brown, L.M. Jelloian et al. · IEEE Electron Device Letters · 1988 · 93 citations