Concepedia

Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties

H. Wojcik, Marcel Junige, W. Bartha, Matthias Albert, Virgínio Henrique de Miranda Lopes Neumann, U. Merkel, A. Peeva, Jürgen Gluch, S. Menzel, Frans Munnik,

Journal of The Electrochemical Society · 2011 · 24 citations · 42 references

DOI

Concepts

Abstract

S.H166-H176

References

42

Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation

Craig M. Herzinger, Blaine Johs, William A. McGahan et al. · Journal of Applied Physics · 1998 · 1.1K citations

, , +17

Simulated annealing analysis of Rutherford backscattering data

N.P. Barradas, C. Jeynes, R.P. Webb · Applied Physics Letters · 1997 · 641 citations

, , +10

Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer

Oh-Kyum Kwon, Jae‐Hoon Kim, Hyoung-Sang Park et al. · Journal of The Electrochemical Society · 2004 · 172 citations

, , +17

Diffusion Studies of Copper on Ruthenium Thin Film

Raymond Chan, Tiruchirapalli Arunagiri, Y. Zhang et al. · Electrochemical and Solid-State Letters · 2004 · 166 citations

, , +17

Cu Wettability and Diffusion Barrier Property of Ru Thin Film for Cu Metallization

Toshihiko Koseki, Takayuki Ohba, Tomohiro Ohta et al. · Journal of The Electrochemical Society · 2005 · 150 citations

, , +16