Marcel Junige - Concepedia

Author

Marcel Junige

Technische Universität Dresden ORCID

Also Known As

M. Junige, Marcel Junige

Publications

262

Citations

H-Index

Concepts

All Affiliations

Technische Universität Dresden Leibniz Institute for Solid State and Materials Research GlobalFoundries (United States)Helmholtz-Zentrum Dresden-Rossendorf GlobalFoundries (Germany)

About

Marcel Junige is an author at Technische Universität Dresden specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	172
2	Applied Physics	5	5	117
3	Chemical Engineering	2	2	55
4	Chemistry	2	2	55
5	Electrical Engineering	2	2	41

Marcel Junige

Publications

224

Citations

H-Index

Page 1

	Year	Citations
Atomic layer deposition for high aspect ratio through silicon vias Martin Knaut, Marcel Junige, Volker Neumann, Microelectronic Engineering Materials ScienceWafer Scale ProcessingEngineeringNanoelectronicsSurface Science	2013	43
<i>In-situ</i> real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen Martin Knaut, Marcel Junige, Matthias Albert, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringMolecular OxygenProcess DevelopmentRu Film ThicknessesChemistry	2011	33
3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating Sebastian Killge, Irene Bartusseck, Marcel Junige, Microelectronic Engineering Materials ScienceMaterials EngineeringElectrical EngineeringRuthenium Seed LayerEngineering	2018	29
Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties H. Wojcik, Marcel Junige, W. Bartha, Journal of The Electrochemical Society	2011	23
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica Marcel Junige, Steven M. George Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringArea-selective MldChemistryPolymersChemical Engineering	2021	22
In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition Marion Geidel, Marcel Junige, Matthias Albert, Microelectronic Engineering Materials ScienceEpitaxial GrowthEngineeringUltra-thin Ruthenium FilmsSurface Science	2012	21
Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO<sub>2</sub>substratum Marcel Junige, Markus Löffler, Marion Geidel, Nanotechnology	2017	18
Graphene based electron field emitter Christian Wenger, Julia Kitzmann, A. Wolff, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Graphene NanomeshesElectrical EngineeringGraphene Top ElectrodeEngineeringGraphene Quantum Dot	2015	12
Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements H. Wojcik, U. Merkel, Kurt Richter, Microelectronic Engineering Materials EngineeringMaterials ScienceEngineeringDiffusion ResistancePeald Ru	2010	12
Selectivity between SiO<sub>2</sub> and SiN<sub><i>x</i></sub> during Thermal Atomic Layer Etching Using Al(CH<sub>3</sub>)<sub>3</sub>/HF and Spontaneous Etching Using HF and Effect of HF + NH<sub>3</sub> Codosing Marcel Junige, Steven M. George Chemistry of Materials	2024	11

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