Marcel Junige

Atomic layer deposition for high aspect ratio through silicon vias

Martin Knaut, Marcel Junige, Volker Neumann et al. · Microelectronic Engineering · 2013 · 43 citations

Materials Science, Wafer Scale Processing, Engineering +10

<i>In-situ</i> real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Martin Knaut, Marcel Junige, Matthias Albert et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 33 citations

Engineering, Molecular Oxygen, Process Development +17

3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating

Sebastian Killge, Irene Bartusseck, Marcel Junige et al. · Microelectronic Engineering · 2018 · 29 citations

Materials Science, Materials Engineering, Electrical Engineering +12

Physical Characterization of PECVD and PEALD Ru(-C) Films and Comparison with PVD Ruthenium Film Properties

H. Wojcik, Marcel Junige, W. Bartha et al. · Journal of The Electrochemical Society · 2011 · 23 citations

Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica

Marcel Junige, Steven M. George · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 22 citations

Engineering, Area-selective Mld, Chemistry +18