Martin Knaut

Atomic Layer Deposition for Coating of High Aspect Ratio TiO₂ Nanotube Layers

Raúl Zazpe, Martin Knaut, Hanna Sopha et al. · Langmuir · 2016 · 85 citations · Full text

Ternary and quarternary TiSiN and TiSiCN nanocomposite coatings obtained by Chemical Vapor Deposition

I. Endler, M. Höhn, Jason D. Schmidt et al. · Surface and Coatings Technology · 2012 · 77 citations

Materials Science, Materials Engineering, Engineering +9

Atomic layer deposition for high aspect ratio through silicon vias

Martin Knaut, Marcel Junige, Volker Neumann et al. · Microelectronic Engineering · 2013 · 43 citations

Materials Science, Wafer Scale Processing, Engineering +10

Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures

Matthias C. Schwille, Timo Schössler, Jonas Barth et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 37 citations

Engineering, Mechanical Engineering, Chemistry +16

<i>In-situ</i> real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen

Martin Knaut, Marcel Junige, Matthias Albert et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 33 citations

Engineering, Molecular Oxygen, Process Development +17