Design properties of polycrystalline silicon

Integrated movable micromechanical structures for sensors and actuators

L.-S. Fan, R.S. Muller · IEEE Transactions on Electron Devices · 1988 · 296 citations

Engineering, Materials Science, Mechanical Engineering +17

Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2

F. W. Smith, G. Ghidini · Journal of The Electrochemical Society · 1982 · 293 citations

Natural Sciences, Chemistry, Materials Science +17

Structure and Stability of Low Pressure Chemically Vapor‐Deposited Silicon Films

T. I. Kamins, Mohammad M. Mandurah, Krishna C. Saraswat · Journal of The Electrochemical Society · 1978 · 190 citations

Natural Sciences, Materials Engineering, Materials Science +17

Fine-grained polysilicon films with built-in tensile strain

H. Guckel, D.W. Burns, C.C.G. Visser et al. · IEEE Transactions on Electron Devices · 1988 · 158 citations

Natural Sciences, Materials Engineering, Materials Science +16

Thermal conductivity of heavily doped low-pressure chemical vapor deposited polycrystalline silicon films

C. H. Mastrangelo, R.S. Muller · Journal of Applied Physics · 1988 · 137 citations

Engineering, Materials Engineering, Materials Science +17