G. Ghidini

Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2

F. W. Smith, G. Ghidini · Journal of The Electrochemical Society · 1982 · 292 citations

Materials Science, Inorganic Chemistry, Chemical Engineering +12

Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides

M. Ceschia, A. Paccagnella, Andrea Cester et al. · IEEE Transactions on Nuclear Science · 1998 · 165 citations

Electrical Engineering, Ion Implantation, Engineering +14

Ionizing radiation induced leakage current on ultra-thin gate oxides

A. Scarpa, A. Paccagnella, F. Montera et al. · IEEE Transactions on Nuclear Science · 1997 · 156 citations

Electrical Engineering, Engineering, Physics +11

Interaction of  H 2 O  with Si(111) and (100): Critical Conditions for the Growth of

G. Ghidini, F. W. Smith · Journal of The Electrochemical Society · 1984 · 115 citations

Engineering, Solid-state Chemistry, Chemistry +22

Low field leakage current and soft breakdown in ultra-thin gate oxides after heavy ions, electron or X-ray irradiation

M. Ceschia, A. Paccagnella, Simone Sandrin et al. · IEEE Transactions on Nuclear Science · 2000 · 76 citations

Electrical Engineering, Ion Implantation, Engineering +15