Fine-grained polysilicon films with built-in tensile strain

H. Guckel, D.W. Burns, C.C.G. Visser, H.A.C. Tilmans, D. Deroo

IEEE Transactions on Electron Devices · 1988 · 158 citations · 4 references

Concepts

Abstract

Novel processing conditions and strain diagnostic structures are used to demonstrate that polysilicon films with built-in tensile-strain can be achieved and that any physical size limitations due to compressive-buckling in polysilicon micromechanical structures can be eliminated.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

References

4