IEEE Journal of Solid-State Circuits · 1986 · 101 citations · 6 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesThermal AnalysisCmos Circuit DesignDevice ModelingDevice ReliabilityDevice ScalingIntegrated Circuit DesignThermal ManagementCmos Fabrication ProcessesCmos ReliabilityCmos ScalingLow-temperature ProcessingThermal Effects In Integrated Circuits
Low-temperature (77K, 4.2K) operation is proposed for bulk CMOS devices to be used in superfast VLSI applications. Symmetrical variation of the parameters of both n-channel and p-channel MOSFETs with respect to the temperature and latch-up immunity makes CMOS a very promising device technology at low temperatures. To demonstrate the performance advantage of circuit operation at low temperatures, inverter chains and 16-kb static random-access memories (RAMs) with 2-/spl mu/m gate length were measured. Average propagation delay for an inverter chain has been reduced to 175 ps (77K) and 104 ps (4.2K) from 296 ps at 300K without sacrificing power dissipation. The power-delay product is less 1 fJ, which is the smallest for silicon devices reported to date. The chip select-access time of the RAM has been reduced to 14.3 ns (77K) from 24 ns (300K).
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Very small MOSFET's for low-temperature operation
F.H. Gaensslen, V.L. Rideout, E.J. Walker et al. · IEEE Transactions on Electron Devices · 1977 · 303 citations
Advanced Hi-CMOS device technology
Yoshio Sakai, Tomohiro Hayashida, Norikazu Hashimoto et al. · 1981 · 10 citations
Engineering, Computer Engineering, Electrical Engineering +17