Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

Mikko Ritala, Kaupo Kukli, Antti Rahtu et al. · Science · 2000 · 483 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic Layer Deposition of Platinum Thin Films

Titta Aaltonen, Mikko Ritala, Timo Sajavaara et al. · Chemistry of Materials · 2003 · 391 citations

Natural Sciences, Chemistry, Materials Science +17

Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications

E. P. Gusev, C. Cabral, M. Copel et al. · Microelectronic Engineering · 2003 · 309 citations

Engineering, Materials Engineering, Materials Science +15

Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum

Titta Aaltonen, Antti Rahtu, Mikko Ritala et al. · Electrochemical and Solid-State Letters · 2003 · 239 citations

Natural Sciences, Chemistry, Materials Science +13

Atomic Layer Deposition of Iridium Thin Films

Titta Aaltonen, Mikko Ritala, Väino Sammelselg et al. · Journal of The Electrochemical Society · 2004 · 152 citations

Natural Sciences, Materials Engineering, Materials Science +17