Publication | Closed Access

Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications

Materials ScienceElectrical EngineeringEpitaxial GrowthUltrathin Hfo2 FilmsEngineeringApplied PhysicsSemiconductor Device FabricationThin FilmsSilicon On InsulatorMicroelectronicsMolecular Beam EpitaxyAtomic Layer DepositionSemiconductor Device