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Atomic force microscope topographical artifacts after the dielectric breakdown of ultrathin SiO2 films

M. Porti, M. Nafrı́a, M. Blum, X. Aymerich, Sascha Sadewasser

Surface Science · 2003 · 34 citations · 8 references

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8

Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon

D. J. DiMaria, E. Cartier, D. Arnold · Journal of Applied Physics · 1993 · 716 citations

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Soft breakdown of ultra-thin gate oxide layers

Michel Depas, T. Nigam, Marc Heyns · IEEE Transactions on Electron Devices · 1996 · 323 citations

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Conducting atomic force microscopy for nanoscale electrical characterization of thin SiO2

Alexander Olbrich, B. Ebersberger, Christian Boit · Applied Physics Letters · 1998 · 167 citations

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Electrical characterization of stressed and broken down SiO2 films at a nanometer scale using a conductive atomic force microscope

M. Porti, M. Nafrı́a, X. Aymerich et al. · Journal of Applied Physics · 2002 · 112 citations

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Kelvin probe force microscopy in ultra high vacuum using amplitude modulation detection of the electrostatic forces

Ch. Sommerhalter, Thilo Glatzel, Th.W Matthes et al. · Applied Surface Science · 2000 · 110 citations

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