Towards the sub-50nm magnetic device definition: Ion beam etching (IBE) vs plasma-based etching

Ultramicro fabrications on Fe-Ni alloys using electron-beam writing and reactive-ion etching

I. Nakatani · IEEE Transactions on Magnetics · 1996 · 63 citations

Engineering, Materials Engineering, Materials Science +16

Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching

N. Matsui, K Mashimo, Akihiro Egami et al. · Vacuum · 2002 · 62 citations

Natural Sciences, Materials Engineering, Materials Science +14

Broad-beam ion sources: Present status and future directions

H. R. Kaufman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 47 citations

Natural Sciences, Nuclear Engineering, Physics +12

Focused ion beam designs for sputter deposition

H. R. Kaufman, J. M. E. Harper, J. J. Cuomo · Journal of Vacuum Science and Technology · 1979 · 29 citations

Natural Sciences, Physics, Microfabrication +12

Giant magnetoresistance in 60–150-nm-wide pseudo-spin-valve nanowires

Fernando Castaño, S. Haratani, C. A. Ross et al. · Applied Physics Letters · 2002 · 22 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17