Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching - Concepedia

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Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching

61

Citations

10

References

2002

Year

N. Matsui, K Mashimo, Akihiro Egami, Akio Konishi, Osamu Okada, Tsutomu Tsukada

Materials ScienceMagnetismMaterials EngineeringEngineeringMicrofabricationSurface ProcessingApplied PhysicsGas Discharge PlasmaPlasma EtchingMagnetic MaterialsPlasma ProcessingCo/nh3 Gas Plasma

References

	Year	Citations

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