Michael Feldbaum

Towards the sub-50nm magnetic device definition: Ion beam etching (IBE) vs plasma-based etching

Xilin Peng, Stacey Wakeham, A. Morrone et al. · Vacuum · 2008 · 30 citations

Natural Sciences, Electrical Engineering, Physics +13

<title>High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors</title>

Tam Pandhumsoporn, Michael Feldbaum, Prashant Gadgil et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 17 citations

Engineering, Electrical Engineering, Materials Science +17

<title>High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication</title>

Tam Pandhumsoporn, Lei Wang, Michael Feldbaum et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 15 citations

Engineering, Electrical Engineering, Materials Science +17

Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch² and Beyond

XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu et al. · Journal of Nanomaterials · 2013 · 15 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +14