Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

Fenton's reagent revisited

Cheves Walling · Accounts of Chemical Research · 1975 · 2.8K citations

Pharmacy, Chemistry, Toxicology +6

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Hideo Aida, Toshiro Doi, Hidetoshi Takeda et al. · Current Applied Physics · 2012 · 257 citations

Engineering, Materials Engineering, Materials Science +14

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Applied Surface Science · 2014 · 105 citations

Natural Sciences, Materials Engineering, Materials Science +15

Atomic-scale flattening mechanism of 4H-SiC (0 0 0 1) in plasma assisted polishing

Hui Deng, Kazuya Yamamura · CIRP Annals · 2013 · 93 citations

Engineering, Materials Engineering, Materials Science +9