XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi, +4

Applied Surface Science

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSi-face Sic +11

Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi, +3

Surface and Coatings Technology

Materials ScienceMaterials EngineeringChemical EngineeringCatalyst NanoparticlesEngineering +10

Evaluation of the action of Tween 20 non-ionic surfactant during enzymatic hydrolysis of lignocellulose: Pretreatment, hydrolysis conditions and lignin structure

Yuan Chen, Yan Zhou, Yanlin Qin, +2

Bioresource Technology

Chemical EngineeringNon-ionic SurfactantEngineeringEnvironmental EngineeringLignin +9

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi, +3

Tribology International

Materials ScienceMaterials EngineeringSic WafersSurface CharacterizationEngineering +8

Non-ionic surfactants do not consistently improve the enzymatic hydrolysis of pure cellulose

Yan Zhou, Hongmei Chen, Feng Qi, +2

Bioresource Technology

Non-ionic SurfactantsEngineeringEnvironmental EngineeringBiotechnologyPure Cellulose +6

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou, +3

Applied Surface Science

Materials EngineeringMaterials ScienceChemical EngineeringEngineeringCeramic Material +10

Improving the enzymatic hydrolysis of dilute acid pretreated wheat straw by metal ion blocking of non-productive cellulase adsorption on lignin

Ardak Akimkulova, Yan Zhou, Xuebing Zhao, +1

Bioresource Technology

Chemical EngineeringBiomass ConversionEngineeringNon-productive Cellulase AdsorptionEnvironmental Engineering +8

Surface modulation to enhance chemical mechanical polishing performance of sliced silicon carbide Si-face

Gaopan Chen, Jianguo Li, Jiangyou Long, +4

Applied Surface Science

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringMaterial Processing +9

Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

Yan Zhou, Guoshun Pan, Hua Gong, +2

Colloids and Surfaces A Physicochemical and Engineering Aspects

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringMaterial Processing +11

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Guoshun Pan, Zhonghua Gu, Yan Zhou, +3

Wear

Materials ScienceMaterials EngineeringChemical EngineeringSio2 Abrasive ParticlesEngineering +9