XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

XPS and STM study of the growth and structure of passive films in high temperature water on a nickel-base alloy

A. Machet, Anouk Galtayries, Sandrine Zanna et al. · Electrochimica Acta · 2004 · 297 citations

Natural Sciences, Materials Engineering, Materials Science +14

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Hideo Aida, Toshiro Doi, Hidetoshi Takeda et al. · Current Applied Physics · 2012 · 257 citations

Engineering, Materials Engineering, Materials Science +14

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

Hydroxyl radical induced degradation of ibuprofen

Erzsébet Illés, Erzsébet Takács, András Dombi et al. · The Science of The Total Environment · 2013 · 136 citations

Pharmacy, Pharmacology, Toxicology +4

The Role of Glycine in the Chemical Mechanical Planarization of Copper

Serdar Aksu, Fiona M. Doyle · Journal of The Electrochemical Society · 2002 · 131 citations

Natural Sciences, Chemistry, Materials Science +16