Chunli Zou

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi et al. · Applied Surface Science · 2014 · 135 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Applied Surface Science · 2014 · 105 citations

Natural Sciences, Materials Engineering, Materials Science +15

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

Guoshun Pan, Yan Zhou, Guihai Luo et al. · Journal of Materials Science Materials in Electronics · 2013 · 87 citations

Engineering, Materials Engineering, Materials Science +16

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Surface and Coatings Technology · 2015 · 87 citations

Engineering, Materials Engineering, Materials Science +14

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry

Xiao‐Lei Shi, Chunli Zou, Guoshun Pan et al. · Tribology International · 2016 · 70 citations

Engineering, Materials Engineering, Materials Science +12