Guoshun Pan

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi et al. · Tribology International · 2015 · 111 citations

Materials Science, Materials Engineering, Sic Wafers +10

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Applied Surface Science · 2014 · 100 citations

Materials Engineering, Materials Science, Chemical Engineering +12

Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate

Wenhu Xu, Xinchun Lu, Guoshun Pan et al. · Applied Surface Science · 2010 · 92 citations

Materials Science, Ultrasonic Flexural Vibration, Engineering +8

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

Guoshun Pan, Yan Zhou, Guihai Luo et al. · Journal of Materials Science Materials in Electronics · 2013 · 82 citations

Materials Science, Materials Engineering, Wafer Scale Processing +12

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Surface and Coatings Technology · 2015 · 82 citations

Materials Science, Chemical Engineering, Engineering +10