Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Hideo Aida, Toshiro Doi, Hidetoshi Takeda et al. · Current Applied Physics · 2012 · 257 citations

Engineering, Materials Engineering, Materials Science +14

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Yan Zhou, Guoshun Pan, Xiao‐Lei Shi et al. · Applied Surface Science · 2014 · 135 citations

Natural Sciences, Materials Engineering, Materials Science +17

Surface Treatment of Silicon Carbide Using TiO₂(IV) Photocatalyst

Yoshie Ishikawa, Yasumichi Matsumoto, Yoko Nishida et al. · Journal of the American Chemical Society · 2003 · 81 citations

Natural Sciences, Materials Engineering, Materials Science +17

On chemo-mechanical polishing (CMP) of silicon nitride (Si3N4) workmaterial with various abrasives

Ming Jiang, Nelson O. Wood, R. Komanduri · Wear · 1998 · 67 citations

Engineering, Materials Engineering, Materials Science +16