Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation

V. A. Gritsenko, S. N. Svitasheva, I. P. Petrenko, Yu. N. Novikov, Yu. N. Morokov, Hei Wong, R. W. M. Kwok, R. W. M. Chan

Microelectronics Reliability · 1998 · 10 citations · 10 references

Concepts

References

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