Sidewall roughness control in advanced silicon etch process

The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control

Henri Jansen, M. de Boer, R. Legtenberg · Journal of Micromechanics and Microengineering · 1995 · 593 citations · Full text

Engineering, Materials Engineering, Materials Science +17

<title>Advanced silicon etching using high-density plasmas</title>

Jy Bhardwaj, Huma Ashraf · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 232 citations

Engineering, Materials Engineering, Materials Science +17

Recent advances in silicon etching for MEMS using the ASE™ process

A. Hynes, Hamza Ashraf, Jy Bhardwaj et al. · Sensors and Actuators A Physical · 1999 · 178 citations

Engineering, Electrical Engineering, Materials Science +14

One-chip multichannel quartz crystal microbalance (QCM) fabricated by Deep RIE

Takashi Abe, Masayoshi Esashi · Sensors and Actuators A Physical · 2000 · 126 citations

Engineering, Materials Engineering, Materials Science +11

Improvement of sidewall roughness in deep silicon etching

M. Chabloz, Yuichi Sakai, T. Matsuura et al. · Microsystem Technologies · 2000 · 49 citations

Engineering, Electrical Engineering, Materials Science +12