Concepedia

Sidewall Roughness Control

Sidewall Roughness Control is a micromachining process optimization technique that specifically governs the surface texture quality of etched vertical profiles in bulk micromachined structures to enhance device performance and reproducibility.

77

Publications

3.3K

Citations

354

Authors

119

Institutions

Publications per year

2017–2026

20

Parents

Publications

77

Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching

Keith Morton, Gregory Nieberg, Shufeng Bai et al. · Nanotechnology · 2008 · 216 citations

, , +16

Thermal Annealing in Hydrogen for 3-D Profile Transformation on Silicon-on-Insulator and Sidewall Roughness Reduction

M.-C.M. Lee, Ming C. Wu · Journal of Microelectromechanical Systems · 2006 · 201 citations · Full text

, , +16

Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures

Chienliu Chang, Yeong-Feng Wang, Yoshiaki Kanamori et al. · Journal of Micromechanics and Microengineering · 2005 · 142 citations

, , +17

Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides

Richard Bojko, J. Li, He Li et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 140 citations

, , +17

Fabrication of add-drop filters based on frequency-matched microring resonators

Tymon Barwicz, Miloš A. Popović, Michael R. Watts et al. · Journal of Lightwave Technology · 2006 · 132 citations

, , +16

1–5 of 77

Authors

354

  1. LJ
    Linke Jian

    National University of Singapore, Singapore

    2 publications · 101 citations

    2

    h-index

  2. IS
    I. Sagnes

    Centre National de la Recherche Scientifique, France

    2 publications · 41 citations

    2

    h-index

  3. GP
    G. Patriarche

    Centre National de la Recherche Scientifique, France

    2 publications · 41 citations

    2

    h-index

  4. FG
    Fan Gao

    Zhejiang University of Technology, China

    2 publications · 60 citations

    2

    h-index

  5. YW
    Yaohui Wang

    Chinese Academy of Sciences, China

    2 publications · 60 citations

    2

    h-index

1–5 of 354

Institutions

119

  1. University of California, Berkeley

    Berkeley, United States

    4 h-index

    7 publications

    532 citations

  2. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    18 publications

    401 citations

  3. Chinese Academy of Sciences

    Beijing, China

    3 h-index

    14 publications

    315 citations

  4. The University of Osaka

    Osaka, Japan

    2 h-index

    8 publications

    134 citations

  5. Georgia Institute of Technology

    Atlanta, United States

    2 h-index

    5 publications

    221 citations

  6. University of Michigan

    Ann Arbor, United States

    2 h-index

    5 publications

    170 citations

  7. Huazhong University of Science and Technology

    Wuhan, China

    2 h-index

    8 publications

    262 citations

  8. Brigham Young University

    Provo, United States

    2 h-index

    11 publications

    341 citations

1–8 of 119

Venues

  1. 5

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 5 publications · 298 citations

    5

    h-index

  3. 4

    h-index

  4. Optics Express

    4 publications · 219 citations

    4

    h-index

  5. Nanotechnology

    3 publications · 333 citations

    3

    h-index

1–5