Enhanced device performance of AlGaN/GaN HEMTs using HfO<sub>2</sub> high-<i>k</i> dielectric for surface passivation and gate oxide

Chang Liu, Eng Fong Chor, L.S. Tan

Semiconductor Science and Technology · 2007 · 178 citations · 24 references

Abstract

10.1088/0268-1242/22/5/011

References

24