Rutile-type TiO2 thin film for high-k gate insulator - Concepedia

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Rutile-type TiO2 thin film for high-k gate insulator

243

Citations

7

References

2003

Year

Masaru Kadoshima, Masahiko Hiratani, Yasuhiro Shimamoto, Kazuyoshi Torii, Hiroshi Miki, Shin’ichiro Kimura, Toshihide Nabatame

Thin Solid Films

EngineeringOxide ElectronicsApplied PhysicsHigh-k Gate InsulatorThin FilmsThin Film Processing

References

	Year	Citations

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