Rutile-type TiO2 thin film for high-k gate insulator

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

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Thermodynamic stability of binary oxides in contact with silicon

K. J. Hubbard, Darrell G. Schlom · Journal of materials research/Pratt's guide to venture capital sources · 1996 · 1.2K citations

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Kinetics of the Anatase‐Rutile Transformation

R. D. Shannon, Joseph A. Pask · Journal of the American Ceramic Society · 1965 · 654 citations · Full text

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Oxidation of commercial purity titanium

J. Unnam, R. N. Shenoy, R. K. Clark · Oxidation of Metals · 1986 · 151 citations

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Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

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