Thin Oxide Films

Thin Oxide Films is a surface oxidation product characterized by a nanoscale-constrained, coherent layer of metal or semiconductor oxide that forms epitaxially or conformally on a substrate, distinguishing it from bulk oxides by its dimensionality-dependent electronic, structural, and interfacial properties.

29.3K

Publications

1.4M

Citations

76.1K

Authors

6.1K

Institutions

Publications per year

2017–2026

6.1K

Authors

76.1K

  1. CS
    Cheol Seong Hwang

    Seoul National University, South Korea

    132 publications · 11.1K citations

    53

    h-index

  2. EF
    Elvira Fortunato

    Universidade Nova de Lisboa, Portugal

    91 publications · 8K citations

    52

    h-index

  3. RM
    Rodrigo Martins

    Universidade Nova de Lisboa, Portugal

    89 publications · 7.7K citations

    51

    h-index

  4. ML
    Markku Leskelä

    University of Helsinki, Finland

    90 publications · 5K citations

    44

    h-index

  5. PS
    Pramod S. Patil

    Shivaji University, India

    76 publications · 4.8K citations

    43

    h-index

1–5 of 76.1K

Venues

  1. Applied Physics Letters

    1.8K publications · 129.2K citations

    156

    h-index

  2. Thin Solid Films

    2.4K publications · 112.9K citations

    136

    h-index

  3. Journal of Applied Physics

    1.4K publications · 78.7K citations

    119

    h-index

  4. Applied Surface Science

    1.3K publications · 62.5K citations

    109

    h-index

  5. Journal of The Electrochemical Society

    JES · 773 publications · 36K citations

    88

    h-index

1–5