Vacuum · 1996 · 10 citations · 15 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMicrofabricationSemiconductor DevicesEtching ProcessesIon ImplantationThin Film EtchingEtch ChemistryEtch MechanismsGallium ArsenideIon Beam EtchingPlasma Etching
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Sidney Addelman, G. E. P. Box, W. G. Hunter et al. · Technometrics · 1979 · 6.5K citations
Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropy
Todd R. Hayes, M. Dreisbach, W. C. Dautremont–Smith et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 142 citations
Natural Sciences, Materials Engineering, Materials Science +17
Reactive ion etching of GaAs using a mixture of methane and hydrogen
Rebecca Cheung, S. Thoms, S.P. Beamont et al. · Electronics Letters · 1987 · 110 citations