A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator

Modeling projection printing of positive photoresists

F.H. Dill, Andrew R. Neureuther, Joshua Tuttle et al. · IEEE Transactions on Electron Devices · 1975 · 232 citations

Engineering, Materials Engineering, Additive Manufacturing +12

A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography

W.G. Oldham, S.N. Nandgaonkar, Andrew R. Neureuther et al. · IEEE Transactions on Electron Devices · 1979 · 216 citations

Engineering, Computer Engineering, Electrical Engineering +15

PROLITH: A Comprehensive Optical Lithography Model

Chris A. Mack · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1985 · 123 citations

Natural Sciences, Materials Engineering, Materials Science +16

Development of positive photoresist

W.G. Oldham, Andrew R. Neureuther · IEEE Transactions on Electron Devices · 1984 · 54 citations

Engineering, Electrical Engineering, Materials Science +13

Identifying And Monitoring Effects Of Lens Aberrations In Projection Printing

Kenny K. Toh, Andrew R. Neureuther · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1987 · 39 citations

Medicine, Vision Science, Machine Vision +13