Concepedia

Photoresists

Photoresist is a light-sensitive material that functions as a resist in photolithography, distinguished by its ability to undergo solubility changes upon exposure to electromagnetic radiation, thereby enabling pattern transfer in microfabrication processes.

1.1K

Publications

43.1K

Citations

3.6K

Authors

758

Institutions

Publications per year

2017–2026

179

Variants

Photo-resists

Parents

Publications

1.1K

SU-8: a low-cost negative resist for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Journal of Micromechanics and Microengineering · 1997 · 972 citations · Full text

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SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography

Aránzazu del Campo, Christian Greiner · Journal of Micromechanics and Microengineering · 2007 · 804 citations

, , +12

Characteristics of resist films produced by spinning

Dietrich Meyerhofer · Journal of Applied Physics · 1978 · 655 citations

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High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Sensors and Actuators A Physical · 1998 · 573 citations · Full text

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The discovery and development of onium salt cationic photoinitiators

James V. Crivello · Journal of Polymer Science Part A Polymer Chemistry · 1999 · 483 citations

, , +14

1–5 of 1.1K

Authors

3.6K

  1. CK
    Christopher K. Ober

    Cornell University, United States

    38 publications · 1.5K citations

    24

    h-index

  2. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    35 publications · 1K citations

    19

    h-index

  3. RL
    Robert L. Brainard

    University at Albany, State University of New York, United States

    21 publications · 831 citations

    17

    h-index

  4. MW
    Martin Wegener

    Karlsruhe Institute of Technology, Germany

    16 publications · 1.8K citations

    16

    h-index

  5. YE
    Yasin Ekinci

    Paul Scherrer Institute, Switzerland

    19 publications · 907 citations

    16

    h-index

1–5 of 3.6K

Institutions

758

  1. Cornell University

    Ithaca, United States

    24 h-index

    178 publications

    7.3K citations

  2. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    23 h-index

    81 publications

    9.2K citations

  3. IBM (United States)

    Armonk, United States

    22 h-index

    135 publications

    10.1K citations

  4. IMEC

    Leuven, Belgium

    20 h-index

    143 publications

    3.5K citations

  5. The University of Texas at Austin

    Austin, United States

    19 h-index

    138 publications

    4K citations

  6. Paul Scherrer Institute

    Villigen, Switzerland

    19 h-index

    73 publications

    3.8K citations

  7. Massachusetts Institute of Technology

    Cambridge, United States

    18 h-index

    57 publications

    3.9K citations

  8. Intel (United States)

    Santa Clara, United States

    18 h-index

    75 publications

    2.2K citations

1–8 of 758

Venues

  1. 30

    h-index

  2. 26

    h-index

  3. Journal of Micromechanics and Microengineering

    JMM · 32 publications · 3.2K citations

    25

    h-index

  4. Applied Physics Letters

    29 publications · 1.3K citations

    23

    h-index

  5. Journal of The Electrochemical Society

    JES · 39 publications · 1.4K citations

    20

    h-index

1–5