Concepedia
Statistics
Publications
2
Citations
31
H-Index
Active since
1991
Affiliations
Siemens (Germany)(Current)
Fraunhofer Institute for Microengineering and Microsystems
R. Schieβl-Hoyler is an author at Siemens (Germany) specializing in optics, computational lithography, and defects.
Publications per year
1991–1991
Simulation of defects in 3-dimensional resist profiles in optical lithography
Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 17 citations
Engineering, Manufacturing Engineering, Physics +14
A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator
Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 14 citations
Natural Sciences, Materials Engineering, Materials Science +12
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