M. Weiβ

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Active since

1991

Affiliations

Fraunhofer Institute for Microengineering and Microsystems(Current)

Siemens (Germany)

M. Weiβ is an author at Fraunhofer Institute for Microengineering and Microsystems specializing in computational lithography, defect modeling, and optical lithography.

Publications per year

1991–1991

Publications

Simulation of defects in 3-dimensional resist profiles in optical lithography

Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 17 citations

Engineering, Manufacturing Engineering, Physics +14

A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator

Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +12

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