Concepedia
Statistics
Publications
3
Citations
59
H-Index
Active since
1990
Affiliations
Siemens (Germany)(Current)
Fraunhofer Institute for Microengineering and Microsystems
G. Czech is an author at Siemens (Germany) specializing in optics, computational lithography, and defect modeling.
Publications per year
1990–1991
Simulation of lithographic images and resist profiles
Wolfgang Henke, G. Czech · Microelectronic Engineering · 1990 · 28 citations
Engineering, Electrical Engineering, Materials Science +14
Simulation of defects in 3-dimensional resist profiles in optical lithography
Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 17 citations
Engineering, Manufacturing Engineering, Physics +14
A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the Solid lithography simulator
Wolfgang Henke, Dieter Mewes, M. Weiβ et al. · Microelectronic Engineering · 1991 · 14 citations
Natural Sciences, Materials Engineering, Materials Science +12
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