Concepedia

Flash lamp annealing with millisecond pulses for ultra-shallow boron profiles in silicon

T. Gebel, M. Voelskow, W. Skorupa, Giovanni Mannino, V. Privitera, F. Priolo, E. Napolitani, A. Carnera

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2002 · 61 citations · 6 references

DOI

Concepts

References

6

Rapid annealing and the anomalous diffusion of ion implanted boron into silicon

A. E. Michel, W. Rausch, Paul Ronsheim et al. · Applied Physics Letters · 1987 · 211 citations

, , +17

Electrical activation kinetics for shallow boron implants in silicon

A. T. Fiory, K.K. Bourdelle · Applied Physics Letters · 1999 · 50 citations

, , +17

Electrical behavior of ultra-low energy implanted boron in silicon

V. Privitera, E. Schroer, F. Priolo et al. · Journal of Applied Physics · 2000 · 45 citations

, , +17

Effect of heating ramp rates on transient enhanced diffusion in ion-implanted silicon

Giovanni Mannino, P.A. Stolk, N. E. B. Cowern et al. · Applied Physics Letters · 2001 · 25 citations

, , +17

Ultra-Shallow Junctions by Ion Implantation and Rapid Thermal Annealing: Spike-Anneals, Ramp Rate Effects

Aditya Agarwal, Hans-J. Gossmann, A. T. Fiory · MRS Proceedings · 1999 · 20 citations

, , +12