Concepedia

Flash Lamp Annealing

Flash Lamp Annealing is a thermal processing technique in which intense, short-duration light pulses from xenon lamps are used to rapidly heat thin films to high temperatures for defect reduction and crystallization, distinguished from conventional annealing methods by its millisecond-scale duration and selective surface heating.

104

Publications

2.9K

Citations

419

Authors

101

Institutions

Publications per year

2017–2026

15

Variants

Fla

Parents

Publications

104

Room-temperature, short-wavelength (400–500 nm) photoluminescence from silicon-implanted silicon dioxide films

W. Skorupa, R.A. Yankov, I. E. Tyschenko et al. · Applied Physics Letters · 1996 · 108 citations

, , +17

Explosive crystallization of amorphous silicon films by flash lamp annealing

Keisuke Ohdaira, Tomoko Fujiwara, Yohei Endo et al. · Journal of Applied Physics · 2009 · 87 citations · Full text

, , +17

Ultra-doped n-type germanium thin films for sensing in the mid-infrared

Sławomir Prucnal, Fang Liu, M. Voelskow et al. · Scientific Reports · 2016 · 83 citations · Full text

, , +17

Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing

W. Skorupa, T. Gebel, R.A. Yankov et al. · Journal of The Electrochemical Society · 2005 · 83 citations

, , +17

10–15 nm Ultrashallow Junction Formation by Flash-Lamp Annealing

Takayuki Ito, Toshihiko Iinuma, Atsushi Murakoshi et al. · Japanese Journal of Applied Physics · 2002 · 82 citations

, , +17

1–5 of 104

Authors

419

  1. WS
    W. Skorupa

    Helmholtz-Zentrum Dresden-Rossendorf, Germany

    36 publications · 1.2K citations

    21

    h-index

  2. SP
    Sławomir Prucnal

    Helmholtz-Zentrum Dresden-Rossendorf, Germany

    19 publications · 485 citations

    13

    h-index

  3. MV
    M. Voelskow

    Helmholtz-Zentrum Dresden-Rossendorf, Germany

    13 publications · 424 citations

    12

    h-index

  4. KO
    Keisuke Ohdaira

    Japan Advanced Institute of Science and Technology, Japan

    12 publications · 340 citations

    11

    h-index

  5. SZ
    Shengqiang Zhou

    Helmholtz-Zentrum Dresden-Rossendorf, Germany

    10 publications · 306 citations

    10

    h-index

1–5 of 419

Institutions

101

  1. Helmholtz-Zentrum Dresden-Rossendorf

    Dresden, Germany

    22 h-index

    225 publications

    7K citations

  2. Japan Advanced Institute of Science and Technology

    Nomi Shi, Japan

    11 h-index

    45 publications

    1.5K citations

  3. Technische Universität Dresden

    Dresden, Germany

    11 h-index

    33 publications

    946 citations

  4. Toshiba (Japan)

    Tokyo, Japan

    8 h-index

    70 publications

    2.2K citations

  5. Japan Science and Technology Agency

    Tokyo, Japan

    3 h-index

    3 publications

    45 citations

  6. University of Oslo

    Oslo, Norway

    3 h-index

    8 publications

    176 citations

  7. TU Bergakademie Freiberg

    Freiberg, Germany

    3 h-index

    9 publications

    109 citations

  8. Ushio (Japan)

    Tokyo, Japan

    3 h-index

    6 publications

    236 citations

1–8 of 101

Venues

  1. Journal of Applied Physics

    15 publications · 379 citations

    12

    h-index

  2. Applied Physics Letters

    8 publications · 374 citations

    8

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 7 publications · 250 citations

    7

    h-index

  4. Thin Solid Films

    6 publications · 99 citations

    6

    h-index

  5. Applied Surface Science

    4 publications · 129 citations

    4

    h-index

1–5