Paul Ronsheim

Rapid annealing and the anomalous diffusion of ion implanted boron into silicon

A. E. Michel, W. Rausch, Paul Ronsheim et al. · Applied Physics Letters · 1987 · 211 citations

Decay Time, Engineering, Silicon On Insulator +16

Imaging of Arsenic Cottrell Atmospheres Around Silicon Defects by Three-Dimensional Atom Probe Tomography

Keith Thompson, P. Flaitz, Paul Ronsheim et al. · Science · 2007 · 186 citations

Engineering, Microscopy, Silicon On Insulator +20

Strained Si NMOSFETs for high performance CMOS technology

K. Rim, Steven J. Koester, M. Hargrove et al. · 2002 · 151 citations

Materials Engineering, Electrical Engineering, Semiconductor Device +11

Mapping of Electrostatic Potential in Deep Submicron CMOS Devices by Electron Holography

M. Gribelyuk, Martha R. McCartney, Jing Li et al. · Physical Review Letters · 2002 · 106 citations

Engineering, Microscopy, Charge Transport +17

Implantation damage and the anomalous transient diffusion of ion-implanted boron

A. E. Michel, W. Rausch, Paul Ronsheim · Applied Physics Letters · 1987 · 100 citations

Point Defects, Engineering, Implantation Damage +16