Self-aligned Patterning

Self-Aligned Patterning is a lithographic patterning technique in semiconductor manufacturing that belongs to the class of pattern transfer methods, distinguished by its use of inherent alignment through material or process self-organization to eliminate overlay errors between successive patterning steps.

Publications

3.5K

Citations

611

Authors

Institutions

Publications per year

2017–2026

Parents

Pattern Transfer

Publications

A 14nm logic technology featuring 2nd-generation FinFET, air-gapped interconnects, self-aligned double patterning and a 0.0588 &#x00B5;m2 SRAM cell size

S. Natarajan, M. Agostinelli, Sheikh A. Akbar et al. · 2014 · 532 citations

Engineering, Computer Engineering, Electrical Engineering +16

A 10nm high performance and low-power CMOS technology featuring 3rd generation FinFET transistors, Self-Aligned Quad Patterning, contact over active gate and cobalt local interconnects

C. Auth, A. Aliyarukunju, M. Asoro et al. · 2017 · 369 citations

Engineering, Computer Engineering, Electrical Engineering +17

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Chris Bencher, Yong Mei Chen, Huixiong Dai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 129 citations

Engineering, Manufacturing Engineering, Materials Science +17

Polar auxin transport: models and mechanisms

Klaartje van Berkel, Rob J. de Boer, Ben Scheres et al. · Development · 2013 · 127 citations

Life Sciences, Plant Biology, Plant Sciences +16

ASAP7 predictive design kit development and cell design technology co-optimization: Invited paper

Vinay Vashishtha, Manoj Vangala, Lawrence T. Clark · 2017 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) · 2017 · 93 citations

Engineering, Computer Engineering, Design +15

1–5 of 97

Authors

611

KO
Kenichi Oyama
Tokyo Electron (Japan), Japan
10 publications · 196 citations
10
h-index
AH
Arisa Hara
Tokyo Electron (Japan), Japan
9 publications · 179 citations
9
h-index
HY
Hidetami Yaegashi
Tokyo Electron (Japan), Japan
9 publications · 181 citations
9
h-index
SN
Sakurako Natori
Tokyo Electron (Japan), Japan
8 publications · 167 citations
8
h-index
YD
Yuelin Du
University of Illinois Urbana-Champaign, United States
7 publications · 150 citations
7
h-index

1–5 of 611

Institutions

1–8 of 99

Venues

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
41 publications · 981 citations
17
h-index
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
2 publications · 54 citations
2
h-index
IEEE Transactions on Electron Devices
2 publications · 66 citations
2
h-index
Nanoscale
2 publications · 58 citations
2
h-index
Applied Physics Letters
2 publications · 39 citations
2
h-index

1–5