Sakurako Natori

Overview: continuous evolution on double-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 52 citations

Engineering, Computer Engineering, Electrical Engineering +10

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyond

Hidetami Yaegashi, Kenichi Oyama, Kazuo Yabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 24 citations

Engineering, Computer Engineering, Electrical Engineering +13

Recent progress on multiple-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 19 citations

Engineering, Manufacturing Engineering, Digital Fabrication +12

The important challenge to extend spacer DP process towards 22nm and beyond

Kenichi Oyama, Eiichi Nishimura, Masato Kushibiki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 17 citations

Engineering, Manufacturing Engineering, Digital Fabrication +16

Process variability of self-aligned multiple patterning

Kenichi Oyama, Shohei Yamauchi, Arisa Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 16 citations

Engineering, Computer Engineering, Computer Science +12