Kazuo Yabe

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyond

Hidetami Yaegashi, Kenichi Oyama, Kazuo Yabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 24 citations

Numerical Aperture, Engineering, 11-Nm Node +18

Reconfirmation of the optical performances of the laser communications terminal onboard the OICETS satellite

Morio Toyoshima, Shiro Yamakawa, Toshihiko Yamawaki et al. · Acta Astronautica · 2004 · 18 citations

Free-space Optical Network, Photonics, Optical Materials +12

The important challenge to extend spacer DP process towards 22nm and beyond

Kenichi Oyama, Eiichi Nishimura, Masato Kushibiki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 16 citations

Engineering, Microfabrication, Important Challenge +12

Advanced self-aligned DP process development for 22-nm node and beyond

Arisa Hara, Eiichi Nishimura, Masato Kushibiki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 15 citations

Numerical Aperture, Engineering, Vlsi Design +18

Important Challenge for Optical Lithography Extension utilizing Double Patterning Process

Hidetami Yaegashi, Kenichi Oyama, Kazuo Yabe et al. · Journal of Photopolymer Science and Technology · 2011 · 12 citations · Full text

Optical Materials, Engineering, Downward Scaling +16