Hidetami Yaegashi

Overview: continuous evolution on double-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 51 citations

Engineering, Electron-beam Lithography, Pattern Transfer +18

Pervaporation of organic solvents by poly[bis(2,2,2‐trifluoroethoxy) phosphazene] membrane

Fumio Suzuki, Kenji Onozato, Hidetami Yaegashi et al. · Journal of Applied Polymer Science · 1987 · 42 citations

Engineering, Membrane Characterization, Chemistry +16

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyond

Hidetami Yaegashi, Kenichi Oyama, Kazuo Yabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 24 citations

Numerical Aperture, Engineering, 11-Nm Node +18

Recent progress on multiple-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 18 citations

Immersion lithography extension to sub-10nm nodes with multiple patterning

Soichi Owa, Shinji Wakamoto, Masayuki Murayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations

Electrical Engineering, Engineering, Electron-beam Lithography +14