Concepedia
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Tela Innovations (United States)
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330
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Low k 1 logic design using gridded design rules
Michael C. Smayling, Huayu Liu, Lynn Cai
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
EngineeringElectronic Design AutomationComputer ArchitectureSystem-level DesignComputer-aided Design +14
2008
55
E-beam to complement optical lithography for 1D layouts
David Lam, Enden D. Liu, Michael C. Smayling, +1
2011
APF pitch-halving for 22nm logic cells using gridded design rules
Michael C. Smayling, Christopher Bencher, Hao D. Chen, +2
Electrical EngineeringPhysical Design (Electronics)EngineeringVlsi DesignCircuit Design +9
30
32nm and below logic patterning using optimized illumination and double patterning
Michael C. Smayling, Valery Axelrad
EngineeringElectronic Design AutomationComputer ArchitectureSystem-level DesignComputer-aided Design +18
2009
26
Interference assisted lithography for patterning of 1D gridded design
Robert T. Greenway, Rudolf Hendel, Kwangok Jeong, +4
Sram BitcellElectrical EngineeringPhysical Design (Electronics)EngineeringVlsi Design +12
23
1D design style implications for mask making and CEBL
Michael C. Smayling
2013
17
Sub-12nm optical lithography with 4x pitch division and SMO-lite
Michael C. Smayling, Koichiro Tsujita, Hidetami Yaegashi, +4
Optical MaterialsEngineeringVlsi DesignElectron-beam LithographyElectronic Design Automation +21
16nm with 193nm immersion lithography and double exposure
Valery Axelrad, Michael C. Smayling
EngineeringElectron-beam LithographyMicroscopyOptic DesignBiomedical Engineering +15
2010
Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i
Peter De Bisschop, Bart Laenens, Kazuya Iwase, +3
EngineeringVlsi DesignComputer ArchitectureMulti-channel Memory ArchitectureJoint Optimization +16
15
22nm logic lithography in the presence of local interconnect
Michael C. Smayling, Robert Socha, Mircea Dusa
Different Lithography OptimizationVia PatterningEngineeringWafer Scale ProcessingElectron-beam Lithography +13
14
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