Valery Axelrad

32nm and below logic patterning using optimized illumination and double patterning

Michael C. Smayling, Valery Axelrad · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 26 citations

Engineering, Computer Engineering, Electrical Engineering +9

<title>Impact of subwavelength CD tolerance on device performance</title>

A. Balasiński, Linard Karklin, Valery Axelrad · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 17 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17

Sub-12nm optical lithography with 4x pitch division and SMO-lite

Michael C. Smayling, Koichiro Tsujita, Hidetami Yaegashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 16 citations

Engineering, Computer Engineering, Design Optimization +12

16nm with 193nm immersion lithography and double exposure

Valery Axelrad, Michael C. Smayling · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 16 citations

Engineering, Manufacturing Engineering, Digital Fabrication +9

Improvement of lithographic performance and reduction of mask cost by simple OPC

Koichiro Tsujita, Koji Mikami, Hiroyuki Ishii et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 12 citations

Engineering, Manufacturing Engineering, Digital Fabrication +8