Linard Karklin

Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances

Huayu Liu, Linard Karklin, Yaoting Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 38 citations

Engineering, Vlsi Design, Mask Design +16

Application of alternating phase-shifting masks to 140-nm gate patterning: linewidth control improvements and design optimization

Huayu Liu, Linard Karklin, Yao-Ting Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 27 citations

Engineering, Vlsi Design, 140-Nm Gate Patterning +18

<title>Impact of subwavelength CD tolerance on device performance</title>

A. Balasiński, Linard Karklin, Valery Axelrad · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 17 citations

Engineering, Optical Transmission System, Tolerance Contours +17

0.35-μm lithography using off-axis illumination

Paul F. Luehrmann, Peter van Oorschot, Hans Jasper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1993 · 12 citations

Engineering, Electron-beam Lithography, Ophthalmology +14

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Michael E. Kling, N. Cave, Bradley J. Falch et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 12 citations

Photonics, Electrical Engineering, Duv Microlithography +15