Concepedia

Phase-shift Lithography

Phase-Shift Lithography is a photolithographic patterning technique in thin-film lithography that enhances resolution by modulating the phase of light through photomask features to create constructive and destructive interference patterns, thereby improving the fidelity of sub-wavelength features.

174

Publications

6.4K

Citations

694

Authors

148

Institutions

Publications per year

2017–2026

9

Variants

Phase-shifting Lithography

Parents

Publications

174

Improving resolution in photolithography with a phase-shifting mask

M. D. Levenson, R. A. Simpson · IEEE Transactions on Electron Devices · 1982 · 646 citations

, , +15

High-performance fully depleted silicon nanowire (diameter /spl les/ 5 nm) gate-all-around CMOS devices

Navab Singh, Ajay Agarwal, L. K. Bera et al. · IEEE Electron Device Letters · 2006 · 639 citations

, , +17

Storing Images in Warm Atomic Vapor

M. Shuker, Ofer Firstenberg, Rami Pugatch et al. · Physical Review Letters · 2008 · 163 citations · Full text

, , +12

Resolution limits of optical lithography

Shinji Okazaki · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 157 citations · Full text

, , +10

Generation of 30−50 nm Structures Using Easily Fabricated, Composite PDMS Masks

Teri W. Odom, V.R. Thalladi, J. Christopher Love et al. · Journal of the American Chemical Society · 2002 · 154 citations

, , +17

1–5 of 174

Authors

694

  1. RS
    Robert Socha

    ASML (Netherlands), Netherlands

    6 publications · 155 citations

    6

    h-index

  2. AE
    Andreas Erdmann

    Fraunhofer Institute for Integrated Systems and Device Technology, Germany

    6 publications · 142 citations

    6

    h-index

  3. TT
    Tsuneo Terasawa

    National Institute of Advanced Industrial Science and Technology, Japan

    5 publications · 152 citations

    5

    h-index

  4. NH
    Norio Hasegawa

    Hitachi (Japan), Japan

    5 publications · 168 citations

    5

    h-index

  5. RM
    Ronald M. Martino

    IBM (United States), United States

    4 publications · 107 citations

    4

    h-index

1–5 of 694

Institutions

148

  1. Hitachi (Japan)

    Tokyo, Japan

    14 h-index

    92 publications

    2.6K citations

  2. IBM (United States)

    Armonk, United States

    10 h-index

    39 publications

    3.4K citations

  3. Intel (United States)

    Santa Clara, United States

    9 h-index

    28 publications

    528 citations

  4. University of California, Berkeley

    Berkeley, United States

    7 h-index

    13 publications

    516 citations

  5. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    6 h-index

    16 publications

    677 citations

  6. AT&T (United States)

    Bedminster, United States

    5 h-index

    15 publications

    261 citations

  7. Massachusetts Institute of Technology

    Cambridge, United States

    5 h-index

    27 publications

    597 citations

  8. MIT Lincoln Laboratory

    Lexington, United States

    5 h-index

    33 publications

    575 citations

1–8 of 148

Venues

  1. 21

    h-index

  2. 11

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 11 publications · 207 citations

    10

    h-index

  4. Applied Optics

    7 publications · 103 citations

    7

    h-index

  5. IEEE Transactions on Electron Devices

    6 publications · 819 citations

    6

    h-index

1–5