Statistics
Publications
16
Citations
247
H-Index
11
Active since
1985
David K. Astolfi is an author at MIT Lincoln Laboratory specializing in materials science, natural sciences, and materials engineering.
Publications per year
1985–2009
16
16
Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks
S. J. Spector, David K. Astolfi, Scott P. Doran et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 30 citations
Natural Sciences, Materials Engineering, Materials Science +13
Subwavelength Optical Lithography with Phase-Shift Photomasks
M. Fritze, Brian Tyrrell, David K. Astolfi et al. · 2003 · 20 citations
PAG segregation during exposure affecting innate material roughness
Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 20 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +16
Photospeed considerations for extreme ultraviolet lithography resists
Paul M. Dentinger, Luke Hunter, Donna J. O’Connell et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 20 citations
Natural Sciences, Materials Engineering, Materials Science +13
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