Scott P. Doran - Concepedia

Author

Scott P. Doran

MIT Lincoln Laboratory

Also Known As

Doran,Scott, S. P. Doran, S.P. Doran, Scott Doran, Scott P. Doran

Publications

313

Citations

H-Index

Concepts

All Affiliations

MIT Lincoln Laboratory Massachusetts Institute of Technology

About

Scott P. Doran is an author at MIT Lincoln Laboratory specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	186
2	Applied Physics	6	6	153
3	Chemistry	3	3	77
4	Health Sciences	1	1	13
5	Computer Engineering	1	1	39

Scott P. Doran

Publications

186

Citations

H-Index

Page 1

	Year	Citations
Supplemental multilevel interconnects by laser direct writing: Application to GaAs digital integrated circuits Jerry G. Black, Scott P. Doran, M. Rothschild, Applied Physics Letters EngineeringDevice IntegrationComputer ArchitectureSupplemental Multilevel InterconnectsIntegrated Circuits	1987	39
Polymer photochemistry at advanced optical wavelengths Theodore H. Fedynyshyn, Roderick R. Kunz, Roger F. Sinta, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringPolymer PhotochemistryResponsive PolymersPolymer Nanocomposites	2000	33
Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks S. J. Spector, David K. Astolfi, Scott P. Doran, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringOptic DesignOptical Lithography	2001	30
Laser-direct-writing processes: Metal deposition, etching, and applications to microcircuits Jerry G. Black, Daniel J. Ehrlich, M. Rothschild, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringDevice IntegrationLaser-direct-writing ProcessesOptoelectronic DevicesIntegrated Circuits	1987	27
Low-temperature laser deposition of tungsten by silane- and disilane-assisted reactions Jerry G. Black, Scott P. Doran, M. Rothschild, Applied Physics Letters Optical MaterialsEngineeringLaser ApplicationsSilicon Hydride VaporsLaser Material	1990	26
High-resolution fluorocarbon-based resist for 157-nm lithography Theodore H. Fedynyshyn, Roderick R. Kunz, Roger F. Sinta, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyChemistryBeam Lithography	2001	18
Prospects for using existing resists for evaluating 157-nm imaging systems Theodore H. Fedynyshyn, Roderick R. Kunz, Scott P. Doran, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyAdvanced Imaging	2000	13

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