Alberto Cabral

PAG segregation during exposure affecting innate material roughness

Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 20 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +16

Polymer photochemistry at the EUV wavelength

Theodore H. Fedynyshyn, Russell B. Goodman, Alberto Cabral et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 19 citations · Full text

Natural Sciences, Chemistry, Materials Science +16

Contributions to innate material roughness in resist

J. M. Roberts, Robert P. Meagley, Theodore H. Fedynyshyn et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 18 citations

Natural Sciences, Materials Engineering, Materials Science +13

Contribution of photoacid generator to material roughness

Theodore H. Fedynyshyn, Indira Pottebaum, David K. Astolfi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +17

Sensitivity of EUV resists to out-of-band radiation

J. M. Roberts, Robert Bristol, Todd R. Younkin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 12 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +12