Russell B. Goodman

Lithography with 157 nm lasers

T. M. Bloomstein, Mark W. Horn, M. Rothschild et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 105 citations · Full text

Engineering, Materials Engineering, Materials Science +14

Critical issues in 157 nm lithography

T. M. Bloomstein, M. Rothschild, Rainer Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17

Dry etching induced damage on vertical sidewalls of GaAs channels

S. W. Pang, W. D. Goodhue, T. M. Lyszczarz et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 57 citations

Engineering, Electrical Engineering, Materials Science +13

A new method for measuring thermal conductivity of thin films

S. A. Govorkov, W. Ruderman, Mark W. Horn et al. · Review of Scientific Instruments · 1997 · 54 citations

Natural Sciences, Materials Science, Physics +15

Outlook for 157-nm resist design

Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +10