T. M. Bloomstein - Concepedia

Author

T. M. Bloomstein

MIT Lincoln Laboratory

Also Known As

T. M. Bloomstein, T.M Bloomstein, T.M. Bloomstein, Theodore M. Bloomstein

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

MIT Lincoln Laboratory Massachusetts Institute of Technology K Lab (United States)Intel (United States)

About

T. M. Bloomstein is an author at MIT Lincoln Laboratory specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	15	22	767
2	Applied Physics	14	20	730
3	Chemical Engineering	2	2	23
4	Natural Sciences	1	1	14
5	Biomedical Engineering	1	1	26

T. M. Bloomstein

Publications

964

Citations

H-Index

Page 1

	Year	Citations
Lithography with 157 nm lasers T. M. Bloomstein, Mark W. Horn, M. Rothschild, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptic Design	1997	105
A Nanoparticle Convective Directed Assembly Process for the Fabrication of Periodic Surface Enhanced Raman Spectroscopy Substrates Vladimir Liberman, T. M. Bloomstein, S. Somu, Advanced Materials	2010	104
22-nm immersion interference lithography T. M. Bloomstein, Michael Marchant, S. Deneault, Optics Express Materials SciencePhotonicsOptical MaterialsImmersion Interference LithographyEngineering	2006	71
Critical issues in 157 nm lithography T. M. Bloomstein, M. Rothschild, Rainer Kunz, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyMicroscopy	1998	64
Review of technology for 157-nm lithography A. K. Bates, M. Rothschild, T. M. Bloomstein, IBM Journal of Research and Development Materials ScienceMaterials EngineeringCritical IssuesEngineeringElectron-beam Lithography	2001	60
Materials issues for optical components and photomasks in 157 nm lithography Vladimir Liberman, T. M. Bloomstein, M. Rothschild, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringElectron-beam LithographyOptical CoatingsFluorine Lasers	1999	54
Liquid immersion lithography: Why, how, and when? M. Rothschild, T. M. Bloomstein, Roderick R. Kunz, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceOptical MaterialsEngineeringElectron-beam LithographyBeam Lithography	2004	49
157 nm: Deepest deep-ultraviolet yet M. Rothschild, T. M. Bloomstein, Jane E. Curtin, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightShort Wavelength OpticOptical MaterialsEngineeringElectron-beam Lithography	1999	48
Outlook for 157-nm resist design Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	1999	47
Outlook for 157 nm resist design Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringNm Resist DesignElectron-beam Lithography	1999	46

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