Concepedia

D. E. Hardy

DE

14

Publications

462

Citations

12

H-Index

1993

Active since

Affiliations

MIT Lincoln Laboratory(Current)

Massachusetts Institute of Technology

K Lab (United States)

U.S. Army Combat Capabilities Development Command Chemical Biological Center

D. E. Hardy is an author at MIT Lincoln Laboratory specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceOptical PropertiesMicrofabricationOptical MaterialsNanolithographyMicroelectronicsOptoelectronicsPhysics

Publications per year

1993–2011

14

Publications

14

22-nm immersion interference lithography

T. M. Bloomstein, Michael Marchant, S. Deneault et al. · Optics Express · 2006 · 71 citations · Full text

Materials Science, Photonics, Optical Materials +15

Critical issues in 157 nm lithography

T. M. Bloomstein, M. Rothschild, Rainer Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 64 citations

Short Wavelength Optic, Optical Materials, Engineering +26

Liquid immersion lithography: Why, how, and when?

M. Rothschild, T. M. Bloomstein, Roderick R. Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 49 citations

Materials Science, Optical Materials, Engineering +14

157 nm: Deepest deep-ultraviolet yet

M. Rothschild, T. M. Bloomstein, Jane E. Curtin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 48 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +23

Outlook for 157-nm resist design

Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 47 citations

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