Jane E. Curtin - Concepedia

Author

Jane E. Curtin

MIT Lincoln Laboratory

Also Known As

J. Curtin, J. E. Curtin, J.E. Curtin, Jane E. Curtin

Publications

394

Citations

H-Index

Concepts

All Affiliations

MIT Lincoln Laboratory Massachusetts Institute of Technology K Lab (United States)

About

Jane E. Curtin is an author at MIT Lincoln Laboratory specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	213
2	Applied Physics	4	4	121
3	Health Sciences	1	1	13
4	Chemical Engineering	1	1	92
5	Chemistry	1	1	92

Jane E. Curtin

Publications

294

Citations

H-Index

Page 1

	Year	Citations
Nanochannel fabrication for chemical sensors Margaret B. Stern, M. W. Geis, Jane E. Curtin Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ionic ConstituentsEngineeringNanoporous MaterialChemistryChemical Charge	1997	92
157 nm: Deepest deep-ultraviolet yet M. Rothschild, T. M. Bloomstein, Jane E. Curtin, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightShort Wavelength OpticOptical MaterialsEngineeringElectron-beam Lithography	1999	48
Outlook for 157-nm resist design Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	1999	47
Outlook for 157 nm resist design Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringNm Resist DesignElectron-beam Lithography	1999	46
LASER MICROMACHINING OF SILICON: A NEW TECHNIQUE FOR FABRICATING HIGH QUALITY TERAHERTZ WAVEGUIDE COMPONENTS' C. K. Walker, Gopal Narayanan, H. Knoepfle, Softwaretechnik-Trends	1997	34
Outlook for 157-nm Resist Designs Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Journal of Photopolymer Science and Technology EngineeringElectron-beam LithographyDefect ToleranceChemical PlatformsResistor	1999	14
Prospects for using existing resists for evaluating 157-nm imaging systems Theodore H. Fedynyshyn, Roderick R. Kunz, Scott P. Doran, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyAdvanced Imaging	2000	13

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